This series comprises Type II (hydrogen-abstraction) radical photoinitiators based on benzophenone (BP) core structure. The product portfolio covers basic small-molecule benzophenone derivatives and polymerizable benzophenone photoinitiators bearing acrylate / methacrylate double bonds. Retaining the excellent surface-curing property of conventional benzophenone, the polymerizable structure enables covalent incorporation into the resin network upon curing, which significantly reduces migration, blooming, extractables and odor. These products are widely applied in UV inks, overprint varnishes, plastic coatings, UV adhesives, electronic photosensitive materials and medical photocurable substrates, complying with strict requirements for food contact and other high-compliance scenarios.
Benefiting from high efficiency, energy saving and solvent-free advantages, UV curing technology has been rapidly expanding its presence in packaging printing, industrial coating, electronic manufacturing and advanced new material sectors. As regulations worldwide continue to tighten restrictions on small-molecule migration, blooming, odor and food-contact safety of UV materials, conventional small-molecule benzophenone (BP) photoinitiators are increasingly unsuitable for high-end applications due to drawbacks including free small-molecule leaching after curing, surface blooming and unpleasant odor.
The Type II hydrogen-abstraction benzophenone photoinitiator family includes basic BP derivatives and polymerizable benzophenone products. It maintains the outstanding surface curing performance of the benzophenone core. Through molecular design, acrylate and methacrylate polymerizable double bonds are introduced into the molecular chain to form low-migration reactive photosensitive systems. As a high-performance upgraded alternative to traditional small-molecule BP, it delivers stable and practical photocuring solutions for various demanding UV formulations.
1. Product Classification and Photocuring Mechanism
Radical photoinitiators fall into two main categories: Type I (cleavage-type) and Type II (hydrogen-abstraction-type). Upon UV excitation, Type I photoinitiators undergo intramolecular bond cleavage to directly generate free radicals and initiate monomer crosslinking. The benzophenone (BP) series is a typical Type II hydrogen-abstraction radical photoinitiator following a bimolecular cooperative hydrogen-abstraction mechanism. The benzophenone chromophore absorbs UV photons and jumps to an excited triplet state. This excited-state molecule cannot generate free radicals independently; it must undergo intermolecular hydrogen abstraction with tertiary amine co-initiators (hydrogen donors) in the formulation. During the reaction, benzophenone gains hydrogen atoms while amine components form aminoalkyl active free radicals. The resulting free radicals attack carbon-carbon double bonds of acrylate monomers and acrylate oligomers to trigger chain polymerization and crosslinking, rapidly forming a solid cured film.
✅ Core characteristics of Type II BP series: No curing activity when used alone; tertiary amine co-initiators must be incorporated into the formulation.
✅ Core advantages: Strong resistance to oxygen inhibition and excellent surface drying performance, especially suitable for thin coatings, pigmented inks and overprint varnishes.
⚠️ Traditional limitation: Ordinary small-molecule benzophenone remains as free small molecules within the resin network after curing, prone to migration, blooming and odor generation, restricting its application in high-safety scenarios.
Representative products:
4-(2-Hydroxyethoxy)benzophenone|CAS 2149581-44-0: Basic small-molecule BP derivative, Type II hydrogen-abstraction photoinitiator, synthetic intermediate
4-Hydroxyethoxyethoxybenzophenone|CAS 16613-04-0: Basic small-molecule BP derivative, Type II hydrogen-abstraction photoinitiator, synthetic intermediate
Molecules only retain the benzophenone photosensitive core without polymerizable carbon-carbon double bonds.
Representative products:
4-Hydroxyvinyloxybenzophenone acrylate, CAS 1137971-16-4: Polymerizable Type II hydrogen-abstraction photoinitiator (methacrylate double bond)
4-Hydroxyethoxybenzophenone methacrylate, CAS 16432-81-8: Polymerizable Type II hydrogen-abstraction photoinitiator (methacrylate double bond)
2-[2-(4-Benzoylphenoxy)ethoxy]ethyl methacrylate, CAS 2035-72-5: Polymerizable Type II hydrogen-abstraction photoinitiator (methacrylate double bond)
2-[2-(4-Benzoylphenoxy)ethoxy]ethyl acrylate, CAS 15419-94-0: Polymerizable Type II hydrogen-abstraction photoinitiator (acrylate double bond)
2-Hydroxy-4-acryloyloxyethoxybenzophenone, CAS 2149581-44-0: Polymerizable Type II hydrogen-abstraction photoinitiator (acrylate double bond)
2-(4-Benzoyl-3-hydroxyphenoxy)ethyl methacrylate, CAS 1137971-16-4: Polymerizable Type II hydrogen-abstraction photoinitiator (methacrylate double bond)
2-Hydroxy-4-(methacryloyloxy)benzophenone, CAS 16432-81-8: Polymerizable Type II hydrogen-abstraction photoinitiator (methacrylate double bond)
2-Hydroxy-4-acryloyloxybenzophenone, CAS 16613-04-0: Polymerizable Type II hydrogen-abstraction photoinitiator (acrylate double bond)
Molecular design highlight: A single molecule integrates benzophenone photosensitive chromophore + polymerizable acrylate / methacrylate carbon-carbon double bond. The curing process proceeds in two steps:
1. Under UV excitation, the BP core undergoes hydrogen abstraction to generate free radicals and initiate crosslinking.
2. The intrinsic acrylate / methacrylate double bonds of the molecule participate in polymerization synchronously, covalently bonding into the polymer resin network instead of remaining as free small molecules inside the cured film.
This fundamentally addresses the pain points of conventional BP: the photosensitive moiety is anchored onto the polymer backbone after curing, drastically reducing migration rate, extractables, volatiles and residual odor, meeting stringent safety controls for food contact, pharmaceutical packaging and high-end electronic materials.
1. Excellent surface drying and strong oxygen inhibition resistance Inherited classic advantage of benzophenone core. It effectively overcomes surface inhibition caused by oxygen in air under thin-film conditions, delivering dry and tack-free cured film surfaces. Ideal for printing inks and overprint varnishes with thin-layer coating, and highly compatible with white and colored pigmented systems.
2. Polymerizable structure, low migration, low extractables and low odor Polymerizable double bonds participate in crosslinking, anchoring photosensitive units into the resin network covalently. It remarkably reduces small-molecule leaching, surface blooming and migration contamination, lowering extractable levels to satisfy high safety standards for food-contact materials and medical substrates.
3. Broad resin compatibility and wide formulation adaptability Good compatibility with epoxy acrylate, polyurethane acrylate, polyester acrylate, pure acrylic resins, various acrylic monomers and reactive diluents. No easy blooming or phase separation, convenient for formulation tuning.
4. Strong UV absorption adaptability and compatibility with multiple light sources UV absorption band matches traditional mercury lamps; some grades are compatible with LED-UV light sources. It can be used alone or blended with Type I cleavage photoinitiators to balance surface curing and deep-section curing, suitable for thick films and highly pigment-filled systems.
5. Outstanding comprehensive mechanical properties of cured films Cured films feature good adhesion, abrasion resistance and chemical resistance. Film flexibility can be adjusted via molecular side chain modification (ethoxylated long chain); yellowing is controllable for clear varnishes and decorative coatings with strict appearance requirements.
6. Diversified product matrix for customized selection Multiple structures including acrylate type, methacrylate type and ethoxylated long-chain modified grades are available. Users may select products flexibly according to formulation viscosity, film flexibility, migration index and curing speed requirements.
.png)
1. Packaging printing UV inks and overprint varnishes (core application) Flexo, screen and offset UV inks; UV overprint varnishes for food flexible packaging and pharmaceutical packaging. Low-migration property prevents small-molecule migration from inks contaminating contents, improves gloss, abrasion and scratch resistance of printed articles, and meets food-contact compliance requirements.
2. Industrial UV protective coatings UV hard coatings and decorative clear varnishes on plastic substrates, paper, wood, BOPP/PET films. It combines excellent surface drying and film flexibility to solve tackiness issues of thin coatings.
3. UV adhesives and pressure-sensitive adhesives Film laminating UV adhesives, optical UV adhesives, electronic component bonding adhesives. It reduces migration and blooming of small molecules to avoid contamination of optical lenses and electronic parts, ensuring long-term device stability.
4. Electronic photosensitive materials PCB photoresists, insulating photosensitive coatings, photosensitive materials for microelectronics. It mitigates risks of circuit contamination and insulation failure caused by migration of photosensitive fragments, meeting precision electronic manufacturing requirements.
5. Photocurable 3D printing resins SLA/DLP photocurable printing resins. Improves surface forming quality of printed parts and reduces extractables, applicable to models and functional parts requiring biosafety.
6. Medical and biological photosensitive material R&D Photocrosslinkable hydrogels, medical photosensitive substrates, biological carrier material development. Suitable for scientific research and medical material sectors with strict control over leachables and extractables.
1. Requirement for co-initiators: This series belongs to Type II hydrogen-abstraction photoinitiators and must be used together with tertiary amine co-initiators; effective curing cannot be achieved with sole addition. UV-specialized tertiary amine co-initiators are recommended.
2. Recommended dosage: 1%~4% by total formulation weight. Adjustment can be made according to coating thickness, pigment loading, light source power, curing line speed and film performance targets. Higher dosage may be adopted for high-pigment systems.
3. Storage conditions: Keep sealed and away from light, UV light sources and high temperature. Avoid prolonged sunlight exposure to prevent attenuation of photosensitive activity.
4. Blending strategy: Can be compounded with Type I cleavage photoinitiators to balance surface drying and deep curing, addressing curing challenges of thick coatings and highly pigment-filled systems.
5. Safety notice: Wear protective gloves and goggles during handling, and maintain adequate workshop ventilation. Avoid direct skin and eye contact.
The global UV curing industry is evolving toward green, low-extractable and high-safety directions. Retaining the excellent surface-curing performance of traditional benzophenone, polymerizable Type II hydrogen-abstraction benzophenone photoinitiators anchor photosensitive moieties via intramolecular polymerizable double bonds, solving small-molecule migration challenges at molecular level. Supported by a complete product portfolio, they serve high-end sectors including printing packaging, industrial coatings, electronic materials and medical photosensitive materials, providing customers with stable, compliant and high-performance UV photocuring solutions and facilitating the green and high-end development of the photocuring industry.
Reg Office: Room 435, Building 9, No.2568 Gudai Road, Minhang District, Shanghai, China.
Pilot Lab: Building 1, No. 589 Qinling Street, Shijiazhuang High-tech Zone,Hebei, China.
Plant Unit 1: Xincheng town clean chemical park, Xinji, Hebei, China.
Plant Unit 2: Dongming County South Chemical Park, Heze City, China.
Tel: +86-21-34943721
WhatsApp:+86 186 1680 6816
Email:Massive@massivechem.com
Info@massivechem.com
Shanghai Massive Chemical Technology Co., Ltd. All Rights Reserved(C)2023 Supported by Record number:沪ICP备18008139号